The area sizes affecting the properties and functions of materials have become thinner and finer, as typified by recent semiconductor devices. Therefore, microanalysis capacity has become indispensable in the instruments used to evaluate these materials. The AXIS Series offers accurate analysis of micron-order areas, which was unthinkable with conventional XPS. The ease of operation of the ESCA-3400 makes it ideal for quality control and manufacturing control.

X-ray photoelectron spectrometer encompassing optimal AXIS Series performance and automated analysis functions

This system is a fusion of a sophisticated and accurate sample handling system with unique AXIS technologies, such as high-speed real-time imaging and uniform charge neutralizer.
The novel detector improves sensitivity compared to the previous detector and offers a minimum analysis area of just 15 µm. It permits automated measurements and enhances analysis throughput.

The pinnacle of XPS that combines optimal AXIS Series performance with multiple surface analysis functions

The AXIS technologies, including high-speed real-time imaging (3 µm max. resolution) and uniform charge neutralizer, coupled with the unique new detector design, achieve significantly higher sensitivity than previous instruments.
AXIS-ULTRA DLD is a world-class analyzer that offers multiple surface analysis functions (FE-AES, UPS, sample reaction chamber, etc.) to perform various types of sample analysis.

The compact size and excellent ease-of-operation make ESCA ideal for quality control and manufacturing control.

Smallest XPS instrument footprint at just 1000 mm (W) × 550 mm (D). Extremely easy to use. The user mode makes routine work extremely easy.
A Windows-platform computer is used as the data system, enabling simple creation of reports.